Céramiques techniques — Méthode d’essai pour déterminer la résistance au plasma des composants céramiques dans les équipements de production à semi-conducteurs
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Reference:
ISO 21859:2019
Publication Year:
2019
Domain:
This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.
21 000 F CFA
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